Process for removing contaminant

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156640, 156644, 156662, 156902, B44C 122, H01L 21306

Patent

active

048530816

ABSTRACT:
Contaminant is removed from the interior of the holes in the vicinity of preselected locations by etching in a gaseous plasma wherein the sheath voltage is controlled in order to direct ions of the plasma to contact the interior of the holes in the vicinity of the preselected locations.

REFERENCES:
patent: 4012307 (1977-03-01), Phillips
patent: 4162932 (1979-07-01), Konicek
patent: 4328081 (1982-05-01), Fazlin
patent: 4425210 (1984-01-01), Fazlin
patent: 4496420 (1985-01-01), Frohlich et al.
patent: 4540464 (1985-09-01), Mueller et al.
patent: 4544439 (1985-10-01), Solomon et al.
patent: 4599134 (1986-07-01), Babu et al.
patent: 4615763 (1986-10-01), Gelorme et al.
patent: 4654115 (1987-03-01), Egitto et al.
patent: 4667058 (1987-05-01), Catalano et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for removing contaminant does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for removing contaminant, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removing contaminant will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-129269

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.