Method of fabricating semiconductor device for preventing antenn

Details Method of fabricating semiconductor device for preventing antenn Method of fabricating semiconductor device for preventing antenn

1999-05-25

2000-11-21

Bowers, Charles

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438637, 438627, 438643, 438648, 438685, 438672, H01L 214763

Patent

active

061502618

ABSTRACT:
A method of fabricating a semiconductor device for preventing an antenna effect. In the invention, there is no additional mask layer or specific process performed. Thus, the fabrication cost does not increase. In addition, extra electrons are released through a path formed in the invention during the plasma-etching step. An antenna effect thus does not occur. The reliability of the semiconductor device is increased.

REFERENCES:
patent: 5312775 (1994-05-01), Fujii et al.
patent: 5593919 (1997-01-01), Lee et al.
patent: 5763954 (1998-06-01), Hyakutake
patent: 5821168 (1998-10-01), Jain
patent: 5913141 (1999-06-01), Bothra
patent: 5960310 (1999-09-01), Jeong

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