Methods for manufacturing a substrate for a liquid jet recording

Details Methods for manufacturing a substrate for a liquid jet recording Methods for manufacturing a substrate for a liquid jet recording

1996-04-04

2000-11-21

Meeks, Timothy

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427574, 427579, 347 61, 347 62, C23C 16511

Patent

active

061499862

ABSTRACT:
A substrate for a liquid jet recording head is provided at least with a supporting member, an exothermic resistive element arranged on the supporting member for generating thermal energy to be utilized for discharging recording liquid, and pairs of wiring electrodes connected to the exothermic resistive element at given intervals. Such a substrate comprises a layer formed with a film produced by the application of a bias ECR plasma CVD method. With the layer thus formed, a desirable configuration of the wiring stepping portions as well as a desirable film quality can be obtained so as to make the surface of the substrate smooth thereby to implement a liquid jet recording head having an excellent durability at a low manufacturing cost when such a substrate is used for the fabrication of the liquid jet recording head.

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IBM Technical Disclosure Bulletin, "Thermal Ink Jet Heater Devices Incorporating Diamond-Like Carbon Films as Protective Overcoats" vol. 34, No. 2, pp. 19-20, Jul. 1991.

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