Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-12-04
2000-08-29
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430325, 430920, G03C 1492
Patent
active
061106410
ABSTRACT:
A photoresist composition comprising an alkali soluble resin, a photoacid generating compound that undergoes photolysis when exposed to a pattern of activating irradiation within a wavelength of from 330 to 700 .mu.m, a crosslinking agent capable of crosslinking the composition when activated by photogenerated acid and a dye that is an aromatic carboxylic acid having phenylazo substitution. The photoresist is characterized by the dye which is soluble in the photoresist solution, unreactive with components of the photoresist composition and may be used in relatively high concentration.
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Derwent Info Ltd., Patent Abstract of Japanese Patent No. 59142538.
Szmanda Charles R.
Trefonas, III Peter
Vizvary Gerald C.
Ashton Rosemary
Baxter Janet
Cairns S. Matthew
Corless Peter F.
Frickey Darryl P.
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