Method of making a surface etched shadow mask

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156644, 156664, C23F 102, B05D 132, H01L 2102

Patent

active

051396106

ABSTRACT:
A scratch reducing shadow mask for providing vapor deposition patterns of bonding metals onto a surface of a die. The shadow mask comprises a top surface and a bottom surface which define a plurality of vias for permitting vaporized bonding metals to pass through the mask. Mask bottom surface comprises a plurality of recessed regions to minimize the contact area of the mask with the die during the vapor deposition process.

REFERENCES:
patent: 2341702 (1944-02-01), Duggan
patent: 2596617 (1952-05-01), Teal
patent: 3275423 (1966-10-01), Triller
patent: 3286690 (1966-11-01), McGlasson et al.
patent: 3574012 (1971-04-01), Penberg
patent: 3653900 (1972-04-01), Black
patent: 3678892 (1972-07-01), Fairchild
patent: 3688740 (1972-09-01), Gesche
patent: 3780700 (1973-12-01), LaFleur et al.
patent: 3824014 (1974-07-01), Abita
patent: 4105493 (1978-08-01), Chaung
patent: 4256532 (1981-03-01), Magdo et al.
patent: 4391034 (1983-07-01), Stuby
patent: 4417946 (1983-11-01), Bohlen et al.
patent: 4588474 (1986-05-01), Gross
patent: 4669416 (1987-06-01), Delgado et al.
patent: 4728392 (1988-03-01), Miura et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of making a surface etched shadow mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making a surface etched shadow mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making a surface etched shadow mask will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1245999

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.