Photosensitive element containing UV sensitive terpolymers

Details Photosensitive element containing UV sensitive terpolymers Photosensitive element containing UV sensitive terpolymers

1982-02-10

1983-05-03

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 20415911, 20415914, 20415922, 526311, G03C 168

Patent

active

043821200

ABSTRACT:
A photolithographic resist with excellent sensitivity for actinic radiation in the short wavelength ultraviolet region is produced from terpolymers of (1) methyl methacrylate, (2) materials such as 3-oximino-2-butanone methacrylate, and (3) compounds such as methacrylonitrile.

REFERENCES:
patent: 3558311 (1971-01-01), Delzenne et al.
patent: 4233394 (1980-11-01), Helbert
patent: 4279984 (1981-07-01), Matsuda et al.
Reichmanis et al., Journal of the Electrochemical society, vol. 127, p. 2514.

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