Method of manufacturing surface acoustic wave device

Details Method of manufacturing surface acoustic wave device Method of manufacturing surface acoustic wave device

1991-07-18

1992-10-06

Kunemund, Robert

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

310313B, 310313R, 4271264, 427100, H01L 4108

Patent

active

051528649

ABSTRACT:
Interdigital transducers and reflectors are formed on a piezoelectric substrate from an aluminum film. The aluminum film is formed by electron beam deposition at a film forming rate which is controlled to be at least 20 .ANG. per second. The aluminum film formed in this way is crystallographically oriented in a constant direction, whereby stressmigration of the aluminum film is suppressed.

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Wolf et al., "Silicon Processing", Lattice Press, Sunset Beach, Calif., 1987, pp. 156-158.
MacDonald et al., "Development of a Two-Step E-Beam Lithography Process for Submicron SAW Device Fabrication", Optical Engineering, vol. 18, No. 1, pp. 53-58.

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