Substrate and method for microscopical observation of amorphous

Details Substrate and method for microscopical observation of amorphous Substrate and method for microscopical observation of amorphous

1996-02-29

1998-08-04

Powell, William

Etching a substrate: processes

Etching of semiconductor material to produce an article...

216 41, 216 56, 216 60, 216 85, B44C 122

Patent

active

057888531

ABSTRACT:
A method for microscopical observation of an amorphous specimen. The method comprises the steps of providing a substrate having at least one outer surface that defines an optically flat and predetermined geometric configuration, including at least one discontinuity; disposing an amorphous specimen in contact with the discontinuity of the substrate; and, selecting a virtual focus point which can act as a referent point on a defocus position axis, thereby maximizing the phase-contrast of the specimen.

REFERENCES:
patent: 4919749 (1990-04-01), Mauger et al.
patent: 5122663 (1992-06-01), Chang et al.
J. Dubochet et al, "Low Temperature Electron Microscopy", Ann. Rev. Bioeng. 1981, vol. 10, pp.133-149.
W. Chiu, "Electron Microscopy of Frozen, Hydrated Biological Specimens", Ann. Rev. Biophys. Chem. 1986, vol. 15, pp. 237-257.
M. Adrian et al, "Cryo-electron microscopy of viruses", Nature, vol. 308, Mar. 1, 1983, pp. 32-36.
A. Fukami et al, "Micro Grid Techniques (continued) and Their Contribution to Specimen Preparation Techniques for High Resolution Work", Journal of Electron Microscopy, vol. 21, No. 2, 99-108, 1972.
Ximen J. et al, "Three dimensional algebraic reconstruction from three mutually orthogonal projections", Optik 71, No. 4 (1985), pp. 145-148.
T. Sumomogi et al, "Nanoscale layer removal of metal surfaces by scanning probe microscope scratching", J. Vac. Sci. Technol. B., vol. 13, No. 3, May/Jun. 1995, pp. 1257-1260.
S. Hosaka et al, "Fabrication of nanostructures using scanning probe microscopes", J. Vac. Sci. Technol. B 13(6), Nov./Dec. 1995, pp. 2813-2818.
S. C. Minne et al, "Atomic force microscope lithograph using amorphous silicon as a resist and advances in parallel operation", J. Vac. Sci. Technol. B 13(3), May/Jun. 1995, pp. 1380-1385.
R.J. Jackman et al, "Fabrication of Submicrometer Features on Curved Substrates by Microcontact Printing", Science, vol. 269, 4 Aug. 1995, pp. 664-666.
G.M. Shedd et al, "Combinations of point source electron beams and simple electrostatic lenses: Initial demonstrations of micro-scale lenses", Rev. Sci. Instrum. 64(9), Sep. 1993, pp. 2579-2584.
L.P. Muray et al, "Experimental evaluation of a scanning tunneling microscope-microlens system", J. Vac. Sci. Technol. B 9(6), Nov./Dec. 1991, pp. 2955-2961.
K.Y. Lee, "Evaluation and application of a very high performance chemically amplified resist for electron-beam lithography", J. Vac. Sci. Technol. B 11(6) Nov./Dec. 1993, pp. 2807-2811.

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