Photosensitive composition containing photosensitive polyamide a

Details Photosensitive composition containing photosensitive polyamide a Photosensitive composition containing photosensitive polyamide a

1996-12-19

1999-10-05

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302831, 4302851, 430920, 430922, 430926, 522 16, 522 26, 522107, G03F 7037, G03F 7038, G03F 709, B41N 108

Patent

active

059621893

ABSTRACT:
A photosensitive composition can be used to prepare negative-working photosensitive elements such as lithographic printing plates. The composition includes a first photocrosslinkable aromatic resin having photocrosslinkable groups and a number average molecular weight of at least about 1500. Also included is a polymerizable monomer, a photocrosslinkable polyester, a photoinitiator, and an aromatic thiazoline photosensitizer. The photosensitive resins are present at a total weight ratio to the monomer of at least 1.5:1.

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