Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-04-18
1999-10-05
Kiliman, Leszek
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419211, 20419212, 20419216, 2041922, 20419232, 427129, 427130, 427131, C23C 1400, C23C 1432
Patent
active
059617926
ABSTRACT:
An improved magnetic-recording disk and a process for manufacturing magnetic-recording disks are disclosed. Precision cold-rolled titanium or titanium alloy is the substrate for a magnetic-recording disk. The surface of the substrate may be hardened by plasma nitriding, plasma carburizing, or plasma carbonitriding. A hard coating may be applied to the substrate by evaporative reactive ion plating or reactive sputtering of aluminum nitride, silicon nitride, silicon carbide, or nitrides, carbides, or borides of titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, or tungsten.
REFERENCES:
patent: 3784402 (1974-01-01), Reedy, Jr.
patent: 3900592 (1975-08-01), Kennedy et al.
patent: 3912461 (1975-10-01), Wakefield
patent: 4226082 (1980-10-01), Nishida
patent: 4743491 (1988-05-01), Asada et al.
patent: 4990362 (1991-02-01), Kibe et al.
patent: 5120615 (1992-06-01), Fukai et al.
patent: 5126179 (1992-06-01), Inagaki
patent: 5131995 (1992-07-01), Suenaga et al.
patent: 5221459 (1993-06-01), Okano et al.
patent: 5707705 (1998-01-01), Nelson
Thorton "Influence Of Apparatus Geometry And Deposition Conditions On The Structure And Topography Of Thick Sputtered Coatings"; J. Vac. Sci. Technol., vol. II, No. 4, Jul./Aug. 1974; pp. 666-670.
Hoffman, et al. "Microstructural Control Of Plasma-Sputtered Refractory Coatings" Handbook of Plasma Processing Technology, Chapter 21; pp. 483-517. (1985).
Bell, et al. "Plasma Surface Engineering" Plasma Heat Treatment, Science and Technology, PYC Edition, Paris, France (1987); pp. 13-53.
Liu, et al. "Ion Nitriding Of Titanium And Zirconium By A dc-Glow Discharge Method" High Temperature Science 10, pp. 53-65, 1978.
Brazanza, et al. "Nitriding Of Metals And Interaction Of The Nitrides With A Low Pressure Hydrogen Plasma", Proc. 4th Int'l Symp. on Plasma Chemistry, S. Veprek & J. Hertz, Eds., Universitat, Zurich, Switzerland (1979); pp. 100-108.
Wirz, et al. "Kinetic And Crystallographic Aspects Of Nitriding Of Metals In A Low Pressure Nitrogen Plasma: Niobium And Molybdenum", Proc. 4th Int'l Sump on Plasma Chemistry, Veprek and Hertz, eds., Universitat, Zurich, Switzerland (1979); pp. 492-293.
Konuma, et al. "Nitriding Of Titanium In A Radio Frequency Discharge", Journal of the Less Common Metals, 52 (1977) 145-152.
Konuma, et al. "Nitriding Of Zirconium In A Radio Frequency Discharge", Journal of the Less Common Metals, 55 (1977) 97-102.
Konuma, et al. "Nitriding And Carburizing Of Metals In A Radio Frequency Discharge" Proc. 4th Int'l Symp. on Plasma Chemistry, S. Veprek & J. Hertz, eds., Universitat, Zurich, Switzerland (1979); pp. 174-179.
Matsumoto, et al. "Nitriding Of Titanium In An R.F. Discharge II: Effect Of The Addition Of Hydrogen To Nitrogen On Nitriding", Journal of the Less Common Metals, 84 (1982) pp. 157-163.
Shibutami, et al. "Nitriding Of Titanium In Microwave Discharges", Journal of the Less Common Metals, 113 (1985); pp. 177-187.
Shibutami, et al. "Nitriding Of Titanium In A Microwave Discharge II. Kinetic Study" Journal of the Less Common Metals, 120 (1986); pp. 93-99.
Konuma "Film Deposition By Plasma Techniques", Springer-Verlag, Berlin, Germany (1992) Ch. 8; pp. 185-194.
Grube, et al. "High-Rate Carburizing In A Glow-Discharge Methane Plasma", Met. Trans. A 91; vol. 9A, Oct. 1978; pp. 1421-1429.
Krauss "Steels: Heat Treatment And Processing Principles", ASM Int'l, Materials Park, Ohio (1990); pp. 319-325.
Edenhofer, et al. "Industrial Processes, Applications And Benefits Of Plasma Heat Treatment", Plasma Heat Treatment, Science & Technology, PYC Edition, Paris, France (1987); pp. 399-415.
Dexter "The Physical And Chemical Processes Of Vacuum And Glow Discharge Carburising" Plasma Heat Treatment, Science & Technology, PYC Edition, Paris, France (1987); pp. 58-71.
Korhonen, et al. "Plasma Nitriding And Ion Plating With An Intensified Glow Discharge" Thin Solid Films, 107 (1983); pp. 387-394.
Nelson Carl W.
Weir Richard D.
Weir Richard S.
Kiliman Leszek
Tulip Memory Systems, Inc.
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