Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1982-08-03
1984-04-24
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430287, 20415922, 20415914, 5253271, G03C 172, C08F29900
Patent
active
044448686
ABSTRACT:
A photosensitive composition, comprising a photo-insolubilizable resin having a styryl type nitrogen-containing heterocyclic residue and an acid and a photosensitive high molecular compound, having high sensitivity for an extremely small photosensitive group content.
REFERENCES:
patent: T888007 (1971-07-01), Tuites et al.
patent: 3912697 (1975-10-01), Pacifici
Journal of Polymer Science: Part A, vol. 2, pp. 2907-2916, (1964), "Some Aspects of Photosensitivity of Poly(Vinyl Cinnamate)", Minoru Tsuda.
Agency of Industrial Science & Technology
Hamilton Cynthia
Kittle John E.
Ministry of International Trade & Industry
LandOfFree
Photosensitive composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-116143