Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1989-06-01
1990-12-25
Straub, Gary P.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
1566171, 1566203, 1566204, 156DIG64, 422249, C30B 1502, C30B 2702, C30B 2906
Patent
active
049800159
ABSTRACT:
In a method for pulling a single crystal, employing a double crucible assembly, the dopant concentration of the molten raw material in an inner crucible prior to the pulling, is raised to a value higher than the dopant concentration C of the molten raw material in the inner crucible at the steady state. Furthermore, at the initial stage of the pulling, the raw material having a dopant content ratio of no greater than kC is introduced into the outer crucible at a rate greater than the rate of decrease of the molten raw material within the inner crucible during the pulling, to achieve a concentration ratio of dopant between the inner and outer crucibles at a target value. Subsequently, the raw material having kC as the dopant content ratio is introduced into the outer crucible, at a rate equal to the rate of decrease of the molten raw material during the pulling.
REFERENCES:
patent: 2892739 (1954-10-01), Rusler
patent: 4134785 (1979-01-01), Lavigna et al.
patent: 4200621 (1980-03-01), Liaw et al.
patent: 4594173 (1986-06-01), Hobgood et al.
patent: 4846927 (1989-07-01), Takahashi
Arai Yoshiaki
Kida Michio
Ono Naoki
Sahira Kensho
Mitsubishi Metal Corporation
Straub Gary P.
LandOfFree
Method for pulling single crystals does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for pulling single crystals, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for pulling single crystals will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1160706