Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1985-06-10
1986-11-25
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
29576R, 29578, 29591, 156652, 156653, 156656, 156657, 1566591, 156662, 156667, 357 4, 357 231, 427 88, 427 93, 427 94, H01L 21306, B44C 122, C03C 1500, C23F 102
Patent
active
046247378
ABSTRACT:
A gate insulating film, a high-resistivity semiconductor film, a low-resistivity semiconductor film and if necessary a conducting film are successively deposited in lamination without exposing them to any oxidizing atmosphere including atmospheric air, and then the source and drain electrodes are selectively formed.
REFERENCES:
patent: 4331758 (1982-05-01), Luo
patent: 4426407 (1984-01-01), Morin et al.
Adams Bruce L.
Burns Robert E.
Lobato Emmanuel J.
Powell William A.
Seiko Instruments & Electronics Ltd.
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