Plasma pinch system and method of using same

Details Plasma pinch system and method of using same Plasma pinch system and method of using same

1988-07-21

1991-02-19

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511121, 31323131, 20429801, 118 501, H01J 724, C23C 1400

Patent

active

049947150

ABSTRACT:
A plasma pinch system includes a fluid-jet pinch device for establishing a plasma source composed of a tenuous vapor preconditioning cloud surrounding a central narrow flowing fine stream of fluid under pressure. A discharge device is connected electrically to the fluid-jet pinch device for supplying an electrical flow through a portion of the fluid stream for establishing an incoherent light emitting plasma therealong. A method of using the plasma pinch system for manufacturing semiconductors, includes exposing a semiconductor wafer to the incoherent light emitted by the plasma for either annealing or etching purposes.

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patent: 3467885 (1969-09-01), Cann
patent: 4277305 (1981-07-01), Bohacheusky
patent: 4369514 (1983-01-01), Silfvast et al.
patent: 4494043 (1985-01-01), Stallings et al.
patent: 4635282 (1987-01-01), Okada et al.
patent: 4663567 (1987-05-01), Wong

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