Contact geometry for improved lateral MOSFET

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257401, 257758, 257750, 257774, 257775, 257776, H01L 2348

Patent

active

054122392

ABSTRACT:
A geometry for the metal contacts in a lateral MOSFET is disclosed. The cross-sectional shape of the metal contacts, which is usually six-sided but may also be a parallelogram, maximizes the cross-sectional area of the contacts while maintaining a required clearance from the gate layer and a required overhang of the lines in an overlying metal layer.

REFERENCES:
patent: 4012764 (1977-03-01), Satonaka
patent: 4196443 (1980-04-01), Dingwall
patent: 4951101 (1990-08-01), Alter et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Contact geometry for improved lateral MOSFET does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Contact geometry for improved lateral MOSFET, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Contact geometry for improved lateral MOSFET will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1139510

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.