Coating apparatus – Gas or vapor deposition
Patent
1995-08-09
1996-12-31
Kunemund, Robert
Coating apparatus
Gas or vapor deposition
118719, 118726, 118723EB, 11872303, 118723VE, 118712, 118713, C23C 1600
Patent
active
055889999
ABSTRACT:
A thin film forming device comprises a vacuum chamber which is vacuous inside, a substrate holder which is provided in the vacuum chamber for holding a substrate thereon and a molecular beam source disposed in the vacuum chamber directed toward the substrate holder. An endoscope is inserted in the vacuum chamber at the tip end thereof and is covered by a transparent protecting tube connected to the tip end of a bellows. As the bellows is stretched or retracted, the tip end portion of the endoscope and the protecting tube can be advanced to a space between the substrate held by the substrate holder and the molecular beam source or retracted into a shelter provided at a side of the space. As a result, it is possible to know the composition of a thin film as well as to observe the irradiation source of material of the thin film and the plasma radiation while the film is being formed on the film-forming surface of the substrate in the vacuum chamber.
REFERENCES:
patent: 4693207 (1987-09-01), Hayakawa
patent: 4810473 (1989-03-01), Tamura
patent: 5000533 (1991-03-01), Gerwers
patent: 5143896 (1992-09-01), Harada
patent: 5358687 (1994-10-01), Ichikawa
patent: 5423914 (1995-06-01), Nakamura
patent: 5456205 (1995-10-01), Sheldon
Eiko Engineering Co., Ltd.
Kunemund Robert
Lund Jeffrie R.
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