Photocopying – Projection printing and copying cameras
Patent
1998-01-16
1999-08-10
Metjahic, Safet
Photocopying
Projection printing and copying cameras
355125, 355122, G03B 2700, G03B 2728, G03B 2704
Patent
active
059367075
ABSTRACT:
A method is providing for making a multi-level reticle which transmits a plurality of incident light intensities, which in turn, are used to form a plurality of thicknesses in a photoresist profile. A partially transmitting film, used as one of the layers of the reticle, is able to provide an intermediate intensity light. The intermediate intensity light has an intensity approximately midway between the intensity of the unattenuated light passing through the reticle substrate layer, and the totally attenuated light blocked by an opaque layer of the reticle. The exposed photoresist receives light at two intensities to form a via hole in the resist in response to the higher intensity light, and a connecting line to the via at an intermediate level of the photoresist in response to the intermediate light intensity. A method for forming the multi-level resist profile from the multi-level reticle is provided as well as a multi-level reticle apparatus.
REFERENCES:
patent: 5143820 (1992-09-01), Kotecha et al.
patent: 5213916 (1993-05-01), Cronin et al.
patent: 5225035 (1993-07-01), Rolfson
patent: 5237393 (1993-08-01), Tominaga
patent: 5308721 (1994-05-01), Garofalo et al.
patent: 5328786 (1994-07-01), Miyazaki et al.
patent: 5328807 (1994-07-01), Tanaka et al.
patent: 5354632 (1994-10-01), Dao et al.
patent: 5358827 (1994-10-01), Garofalo et al.
patent: 5384218 (1995-01-01), Tokui et al.
patent: 5384219 (1995-01-01), Dao et al.
patent: 5414746 (1995-05-01), Deguchi et al.
patent: 5426010 (1995-06-01), Morton
patent: 5427876 (1995-06-01), Miyazaki et al.
patent: 5446521 (1995-08-01), Hainsey et al.
patent: 5460908 (1995-10-01), Reinberg
patent: 5465859 (1995-11-01), Chapple-Sokol et al.
patent: 5477058 (1995-12-01), Sato
patent: 5482799 (1996-01-01), Isao et al.
patent: 5589303 (1996-12-01), DeMarco et al.
patent: 5725975 (1998-03-01), Nakamura et al.
Article entitled, "Fabrication of 64M Dram with i-Line Phase-Shift Lithography" by K. Nakagaw, M. Taguchi and T. Ema printed in the IEDM 90-817, 1990 IEEE, pp. 33.1.1-33.1.4.
Article entitled, "Transparent Phase Shifting Mask", by H. Watanabe, Y. Todokoro, and M. Inoue, printed in the IEMM 90-821, 1990 IEEE, pp. 33.2.1-33.2.4.
Article entitled, "The Control of Sidelobe Intensity with Arrangement of the Chrome Pattern (COSAC) in Half-Tone Phase-Shifting Mask", by S. Kobayashi, N. Oka, K. Watanabe, M. Inoue and K. Sakiyama, reprinted from Extended Abstracts of 1995 Int'l Conference on Solid State Devices and Materials, 8-95, pp. 935-937.
Article entitled, "Improving Resolution in Photolithography with a Phase-Shifting Mask", by M. Levenson, N.S. Viswanathan and R. Simpson, printed in the IEEE Transactions on Electron Devices, vol. ED-29, No. 12, 12-82.
Article entitled, "Phase Masks and Grey-Tone Masks", by Pierre Sixt, Litomask by SCEM, Neuchatel, Switzerland, printed in Semiconductor Fabtech, Issue No. 2, 1995, pp. 209-213.
Evans David Russell
Nguyen Tue
Ulrich Bruce Dale
Kim Peter
Maliszewski Gerald
Metjahic Safet
Ripma David C.
Sharp Kabushiki Kaisha
LandOfFree
Multi-level reticle system and method for forming multi-level re does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multi-level reticle system and method for forming multi-level re, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-level reticle system and method for forming multi-level re will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1125365