Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-01-05
1990-06-26
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419229, 20429803, C23C 1454
Patent
active
049369644
ABSTRACT:
A substrate film coated with a transparent conductive metal oxide thin film which has uniform light transmittance, uniform sheet resistance and uniform adhesion can be semi-continuously produced by (a) using a semi-continuous roll-to-roll sputtering apparatus for supplying a transparent substrate film to be coated and which comprises a plasma emission spectroanalysis system, a system for measuring the light transmittance and sheet resistance of the resulting transparent conductive film and a system for feeding the measurement results of the above two systems to a controller for controlling the rate of oxygen feed or the discharge current or power, (b) measuring the light transmittance and sheet resistance of the transparent conductive film produced as well as the atomic spectral intensities of the target component(s) and argon present in the vicinity of the target surface, and (c) controlling the rate of oxygen feed or the discharge power or current so that the measured atomic spectral intensities of the target component(s) and argon or their computation results may be kept constant and further simultaneously controlling the anode current so that the atomic spectral intensity of argon is kept in a given range, in order to maintain the light transmittance and sheet resistance of the resultant film within their respective predetermined ranges and to provide good adhesion between the substrate film and the thin film.
REFERENCES:
patent: 4166783 (1979-09-01), Turner
patent: 4336119 (1982-06-01), Gillery
patent: 4407709 (1983-10-01), Enjouji et al.
patent: 4661229 (1987-04-01), Hemming et al.
Sumitomo Bakelite Company Limited
Weisstuch Aaron
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