Photosensitive quinolone compounds and a process of preparation

Details Photosensitive quinolone compounds and a process of preparation Photosensitive quinolone compounds and a process of preparation

1997-03-07

1999-02-02

Gulakowski, Randy

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430169, 430189, 430190, 528 99, 534558, 534561, 546156, 546159, 546171, 546177, G03C 152, C08G 5900

Patent

active

058662952

ABSTRACT:
The present invention relates to novel photosensitive quinolone compounds, specifically novel 3-diazo 2,4-quinolinedione compounds, that may be used in a variety of applications, such as, photosensitive coating compositions, pharmaceuticals, agricultural, amongst others. The invention further relates to a process for making the novel photosensitive 3-diazo 2,4-quinolinedione compounds. These compounds are particularity useful as a photoactive component in a positive working photoresist composition, particularity for use as a deep ultraviolet (UV) photoresist.

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