Simple repair method for phase shifting masks

Details Simple repair method for phase shifting masks Simple repair method for phase shifting masks

1997-01-14

1998-08-18

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

057956855

ABSTRACT:
A method and apparatus for correcting defects in a phase shift mask to be used in photolithography. More specifically, the method of the invention includes creating a second repair mask which contains phase shifters. Regions surrounding the defects on the first mask are made opaque. The design circuitry located in these defective regions is copied onto the second mask. During a second exposure the design circuitry is placed onto the semiconductor wafer. Therefore, this method and apparatus provides an inexpensive solution to a difficult problem.

REFERENCES:
patent: 5418092 (1995-05-01), Okamoto
patent: 5464713 (1995-11-01), Yoshioka et al.
patent: 5468578 (1995-11-01), Rolfson
patent: 5472813 (1995-12-01), Nakagawa
patent: 5472814 (1995-12-01), Lin
patent: 5481473 (1996-01-01), Kim et al.
patent: 5497334 (1996-03-01), Russell et al.
patent: 5523186 (1996-06-01), Lin et al.
patent: 5553273 (1996-09-01), Liebmann
patent: 5553274 (1996-09-01), Liebmann et al.

Affiliated with

Also associated with

Rating

Simple repair method for phase shifting masks does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Simple repair method for phase shifting masks, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Simple repair method for phase shifting masks will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1113354