Integrated tip strain sensor for use in combination with a singl

Details Integrated tip strain sensor for use in combination with a singl Integrated tip strain sensor for use in combination with a singl

1993-11-24

1994-09-13

Williams, Hezron E.

Measuring and testing

Surface and cutting edge testing

Roughness

250306, 250307, 437 8, G01N 2700, G01N 2300

Patent

active

053458168

ABSTRACT:
An integrated tip strain sensor is combination with a single axis atomic force microscope (AFM) for determining the profile of a surface in three dimensions. A cantilever beam carries an integrated tip stem on which is deposited a piezoelectric film strain sensor. A high-resolution direct electron beam (e-beam) deposition process is used to grow a sharp tip onto the silicon (Si) cantilever structure. The direct e-beam deposition process permits the controllable fabrication of high-aspect ratio, nanometer-scale tip structures. A piezoelectric jacket with four superimposed elements is deposited on the tip stem. The piezoelectric sensors function in a plane perpendicular to that of a probe in the AFM; that is, any tip contact with the linewidth surface will cause tip deflection with a corresponding proportional electrical signal output. This tip strain sensor, coupled to a standard single axis AFM tip, allows for three-dimensional metrology with a much simpler approach while avoiding catastrophic tip "crashes". Two-dimensional edge detection of the sidewalls is used to calculate the absolute value or the linewidth of overlay, independent of the AFM principle. The technique works on any linewidth surface material, whether conductive, non-conductive or semiconductive.

REFERENCES:
patent: 4343993 (1982-08-01), Binnig et al.
patent: 4506154 (1985-03-01), Scire
patent: 4724318 (1988-02-01), Binning
patent: 4806755 (1989-02-01), Duerig et al.
patent: 4851671 (1989-07-01), Pohl
patent: 4851767 (1989-07-01), Halbourt et al.
patent: 4883959 (1989-11-01), Hosoki et al.
patent: 4888550 (1989-12-01), Reid
patent: 4902892 (1990-02-01), Okayama et al.
patent: 4916315 (1990-04-01), Otaka
patent: 4918309 (1990-04-01), Beha et al.
patent: 4924091 (1990-05-01), Hansma et al.
patent: 4924713 (1990-05-01), Machino et al.
patent: 4943719 (1990-07-01), Akamine et al.
patent: 5066358 (1991-11-01), Quate et al.
patent: 5092163 (1992-03-01), Young
patent: 5162653 (1992-11-01), Hosaka et al.
patent: 5171992 (1992-12-01), Clabes et al.
patent: 5186041 (1993-02-01), Nyyssonen
patent: 5196701 (1993-03-01), Foster et al.
J. Vac. Sci. Technol. B7 (6), K. L. Lee et al. "Direct electron-beam patterning for nanolithography," Nov./Dec. 1989, pp. 1941-1946.
Tortonese et al., "Atomic Force Microscopy Using A Piezoresistive Cantilever", presented at Transducers '91, Stanford, Calif. Mar. 1991, four pages plus cover.

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