Photopolymerizable composition

Details Photopolymerizable composition Photopolymerizable composition

1992-06-22

1995-01-31

Rodee, Christopher D.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430285, 430287, 430920, 522 13, 522 14, 522 15, 522 24, 522 25, G03C 172

Patent

active

053858077

ABSTRACT:
A photopolymerizable composition comprises: (i) a polymerizable compound carrying an addition-polymerizable unsaturated bond; (ii) a methine compound; (iii) at least one compound selected from the group consisting of: (a) compounds having carbon-halogen bonds, (b) aromatic onium salts, (c) organic peroxides, (d) thio compounds, (e) hexaaryl-biimidazoles, (f) ketooxime esters, and (g) compounds represented by the following general formula (III): ##STR1## wherein R.sup.6, R.sup.7, R.sup.8 and R.sup.9 may be the same or different and each represents a substituted or unsubstituted alkyl, aryl, alkenyl, alkynyl or heterocyclic group, provided that at least two of R.sup.6, R.sup.7, R.sup.8 and R.sup.9 may be bonded together to form a ring structure and that at least one of them represents an alkyl group; and Z.sup.+ represents an alkali metal cation or a quaternary ammonium cation. The composition has a high sensitivity to a wide range of actinic light rays extending from ultraviolet to visible light.

REFERENCES:
patent: 3563749 (1971-02-01), Munder et al.
patent: 4481276 (1984-11-01), Ishikawa et al.
patent: 4505793 (1985-03-01), Tamoto et al.
patent: 4789619 (1988-12-01), Ruckert et al.
patent: 5011760 (1991-04-01), Yamaguchi et al.
patent: 5049481 (1991-09-01), Okamoto et al.

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