Method for producing magnetic medium

Details Method for producing magnetic medium Method for producing magnetic medium

1984-12-06

1987-02-03

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C23C 1436

Patent

active

046407553

ABSTRACT:
A method for producing a magnetic medium which includes the steps of sputtering a magnetic material containing iron onto a substrate in an atmosphere of argon gas mixed with nitrogen gas and depositing a magnetic film on the substrate. The nitrogen is preferably present in an amount of 10 to 10000 ppm and serves to increase the saturation intensity of magnetization. The preferred version of the method consists in jointly sputtering a rare earth metal and an iron-cobalt.

REFERENCES:
patent: 3303116 (1967-02-01), Maissel et al.
patent: 4367257 (1983-01-01), Arai et al.
C. T. Burilla et al, Multiple-Target Method for Sputtering Amorphous Films for Bubble-Domain Devices, Am. Inst. Phys. Conference Proceedings, 1976, pp. 340-342.

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