Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1993-06-01
1995-10-03
Mintel, William
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257393, 257506, 257510, 257903, H01L 27088, H01L 27105, H01L 21762
Patent
active
054554381
ABSTRACT:
Disclosed is a semiconductor integrated circuit device having a plurality of fine memory devices and its fabrication method, and particularly to a semiconductor integrated circuit device capable of suppressing the kink current disturbance of MOS transistors without reducing the junction characteristic of the diffusion layers and its fabrication method. In this device, an angle between the lower surface of each edge of a field oxide formed in an environmental device area, i.e. a peripheral circuit area, and the main surface of a semiconductor substrate is smaller than an angle between the lower surface of each edge of a field oxide formed in a memory cell area and the main surface of the semiconductor substrate. Further, the extension, in the direction of being parallel to the main surface of the semiconductor substrate, of each edge of the field oxide in the environmental device area is larger than the extension, in the direction of being parallel to the main surface of the semiconductor substrate, of each edge of the field oxide in the memory cell area.
REFERENCES:
patent: 5057449 (1991-10-01), Lowrey et al.
patent: 5196910 (1993-03-01), Moriuchi et al.
Patent Abstracts of Japan, Kokai #63-079371, vol. 012314, Abs. Published Aug. 25, 1988.
Patent Abstracts of Japan, Kokai #63-140567, vol. 012397, Abs. Published Oct. 21, 1988.
Patent Abstracts of Japan, Kokai #03-187224, vol. 015442, Abs. Published Nov. 11, 1991.
Hashimoto Naotaka
Hashimoto Takashi
Ishida Hiroshi
Ohki Nagatoshi
Shimizu Akihiro
Brown Peter Toby
Hitachi , Ltd.
Hitachi VLSI Engineering Corp.
Mintel William
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