Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1994-06-16
1995-10-03
Crane, Sara W.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257523, 257590, 257617, H01L 2932, H01L 29227
Patent
active
054554373
ABSTRACT:
The present invention is mainly characterized in that a semiconductor device having a well which is of the same conductivity type as that of a substrate and which is isolated from the substrate is improved not to cause interference between the well and the substrate even if a large amount of minority carriers are implanted. The semiconductor device is provided with a semiconductor substrate of the first conductivity type having the main surface. A first well of a first conductivity type is provided in the main surface of the semiconductor substrate. The first well, having side portions and a bottom portion, extends from the main surface. A second well of a second conductivity type is provided in the main surface of the semiconductor substrate so as to surround the side portions and the bottom portion of the first well. The bottom portion of the second well has a crystal defect region.
REFERENCES:
patent: 3899793 (1975-08-01), Wakamiya et al.
patent: 4053925 (1977-10-01), Burr et al.
patent: 4240096 (1980-12-01), Hiraki et al.
patent: 4259683 (1981-03-01), Adler et al.
patent: 4278475 (1981-07-01), Bartko et al.
patent: 4633289 (1986-12-01), Chen
patent: 4656493 (1987-04-01), Adler et al.
patent: 4684413 (1987-08-01), Goodman et al.
patent: 4710477 (1987-12-01), Chen
patent: 4716451 (1987-12-01), Hsu et al.
patent: 4805008 (1989-02-01), Yao et al.
patent: 4920396 (1990-04-01), Shinohara et al.
patent: 5070381 (1991-12-01), Scott et al.
patent: 5097308 (1992-03-01), Salih
Szc, S. M., "Physics of Semiconductor Devices," 1981, p. 21.
"Proximity gettering with mega-electron-volt carbon and oxygen implantations", by H. Wong et al., Appl. Phys. Lett. 52, No. 12, Mar. 1988, pp. 1023-1025.
Komori Shigeki
Kuroi Takashi
Crane Sara W.
Guay John
Mitsubishi Denki & Kabushiki Kaisha
LandOfFree
Semiconductor device having crystalline defect isolation regions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Semiconductor device having crystalline defect isolation regions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device having crystalline defect isolation regions will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1079062