Semiconductor memory device with increased charge retention capa

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257306, 257399, 257 68, H01L 27108, H01L 2976

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active

06121650&

ABSTRACT:
A semiconductor device includes a gate electrode (4) formed of a conductive material on a semiconductor substrate (1) of one conductivity type with a gate insulating film (3) therebetween; first and second diffusion regions (5, 10) of another conductivity type formed on the semiconductor substrate (1) so as to sandwich the gate electrode (4); and a contact hole (17) for electrically connecting one (first) (10) of the first and second diffusion regions (5, 10) to a lower electrode (8) of a cell capacitor for storing charge therein, and has a characteristic that when a reverse voltage Vrev is applied as a junction application voltage between semiconductors of different conductivity types of the first diffusion region (10) and the semiconductor substrate (1) (positive potential is applied to the n-type semiconductor side and zero or negative potential, to the p-type semiconductor side), a leakage current Ileak flows between the first diffusion region (10) and the semiconductor substrate (1), and the junction application voltage Vrev when the leakage current Ileak is

REFERENCES:
patent: 5440165 (1995-08-01), Mitsunaga et al.
patent: 5932906 (1999-08-01), Shimizu

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