Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-07-08
2000-01-04
Nguyen, Nam
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302881, 430915, 430920, 430925, 522 26, 522 63, G03C 1725
Patent
active
06010824&
ABSTRACT:
A photosensitive resin composition comprising a polymeric binder, an ethylenically unsaturated monomer and a photopolymerization initiator is disclosed. Also, a PS plate using the same is disclosed. The photopolymerization initiator comprises at least one compound selected from specific triazine compounds having a bromine atom on the substituted phenyl nucleus thereof and specific trihalomethyl-containing triazine compounds. The composition has high photosensitivity sufficient for exposure with an argon laser light and satisfactory developability. Additionally disclosed is a photosensitive resin composition comprising a polymeric binder, a monomer having an ethylenically unsaturated double bond and photopolymerization initiators including an acridine compound and a specific triazine compound. This second photosensitive resin composition has high sensitivity, high resolution and a wide development margin. Using this photosensitive resin composition, color filters and PS plates can be produced that have high sensitivity and resolution even to low-energy visible light and which assure high pattern reproducibility.
REFERENCES:
patent: 3181461 (1965-05-01), Fromson
patent: 3779778 (1973-12-01), Smith et al.
patent: 3834998 (1974-09-01), Watanabe et al.
patent: 3891516 (1975-06-01), Chu
patent: 4239850 (1980-12-01), Kita et al.
patent: 4258123 (1981-03-01), Nagashima et al.
patent: 4272610 (1981-06-01), Breslow et al.
patent: 4505793 (1985-03-01), Tamoto et al.
patent: 4521503 (1985-06-01), Herbert
patent: 4578342 (1986-03-01), Sekiya
patent: 4774163 (1988-09-01), Higashi
patent: 4801527 (1989-01-01), Takamiya et al.
patent: 4810618 (1989-03-01), Koike et al.
patent: 4820607 (1989-04-01), Toshiaki
patent: 4826753 (1989-05-01), Higashi et al.
patent: 4845011 (1989-07-01), Wilczak et al.
patent: 4983498 (1991-01-01), Rode et al.
patent: 4985341 (1991-01-01), Rode et al.
patent: 4987055 (1991-01-01), Rode et al.
patent: 5043249 (1991-08-01), Rode et al.
patent: 5049479 (1991-09-01), Zertani et al.
patent: 5066564 (1991-11-01), Zertani et al.
patent: 5068371 (1991-11-01), Steiner et al.
patent: 5085974 (1992-02-01), Frass et al.
patent: 5219709 (1993-06-01), Nagasaka et al.
patent: 5229253 (1993-07-01), Zertani et al.
patent: 5300399 (1994-04-01), Wilczak
patent: 5332650 (1994-07-01), Murata et al.
patent: 5336574 (1994-08-01), Igarashi et al.
Aoyama Toshimi
Iwai Takeshi
Komano Hiroshi
Ohta Katsuyuki
Uchikawa Kiyoshi
Nguyen Nam
Tokyo Ohka Kogyo Co. Ltd.
Ver Steeg Steven H.
LandOfFree
Photosensitive resin composition containing a triazine compound does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive resin composition containing a triazine compound , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive resin composition containing a triazine compound will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1071339