Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1985-11-06
1987-11-10
Kellogg, Arthur
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156345, 156646, 156638, 20419234, B44C 122
Patent
active
047055952
ABSTRACT:
Disclosed is a method for microwave plasma processing characterized by providing a plasma processing period of time having no radio-frequency voltage applied to the sample stage. Particularly, if the present invention is used for the shaping by etching of the conductive material layer provided on an underlying insulation material, effects such as shortening of processing time and improvement of etching accuracy can be obtained in the case that the radio-frequency voltage is applied only for the period of time for removing the surface oxide film of the portion to be etched, or in the case that the radio-frequency voltage is further applied until nearly the time to initiate over-etching, and, the latter case is also effective for making the side wall of the portion to be etched vertical.
REFERENCES:
patent: 4208240 (1980-06-01), Latos
patent: 4581100 (1986-04-01), Hatzakis et al.
Hamazaki Ryoji
Ninomiya Ken
Nishimatsu Shigeru
Okudaira Sadayuki
Suzuki Keizo
Hitachi , Ltd.
Kellogg Arthur
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