Method of plasma-activated reactive deposition of electrically c

Details Method of plasma-activated reactive deposition of electrically c Method of plasma-activated reactive deposition of electrically c

1995-02-15

1996-08-27

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427569, 427575, 427573, 427534, H05H 124, H05H 130, C23C 1402

Patent

active

055499376

ABSTRACT:
Uniform electrically conducting multicomponent material is deposited on an electrically conducting substrate by means of a PCVD method. A plasma, for example a glow discharge plasma, a high frequency plasma or a microwave plasma is generated in a reaction space. The plasma is periodically reciprocated. Starting materials for the single components of the multicomponent material are added to a flowing gas phase. To obtain multicomponent material of the desired composition, the flowing gas phase is split into at least two flowing gas phases each comprising only starting materials for a single component of the multicomponent material. The separate gas phases are time sequentially applied to the plasma. The deposited multicomponent material may be subjected to a thermal treatment.

REFERENCES:
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patent: 4713259 (1987-12-01), G artner et al.
patent: 4894256 (1990-01-01), G artner et al.
patent: 4965090 (1990-10-01), G artner et al.
patent: 5283085 (1994-02-01), G artner et al.

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