Flow verification for process gas in a wafer processing system a

Details Flow verification for process gas in a wafer processing system a Flow verification for process gas in a wafer processing system a

1991-04-22

1993-06-15

Lall, Parshotam S.

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364558, 73223, G06F 1546

Patent

active

052205150

ABSTRACT:
The flow of process gas used in a semiconductor wafer fabrication system is verified against the known flow of a verification gas using a derivative of the ideal gas law:

REFERENCES:
patent: 4364413 (1982-12-01), Bersin et al.
patent: 4801352 (1989-01-01), Piwczyk
patent: 4949669 (1990-08-01), Ishii et al.
patent: 4989160 (1991-01-01), Garrett et al.

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