Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-12-04
1997-10-21
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430326, 430905, 430910, 522 31, 522 59, G03F 7004, G03F 726
Patent
active
056794967
ABSTRACT:
A chemically amplified positive resist composition contains a novel trifluoromethanesulfonic or p-toluenesulfonic acid sulfonium salt having at least one tert-butoxycarbonylmethoxy group as an acid labile group. The composition is highly sensitive to high energy radiation, especially KrF excimer laser and has high sensitivity, resolution and plasma etching resistance while the resulting resist pattern is heat resistant.
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patent: 5403695 (1995-04-01), Hayase et al.
Kawai Yoshio
Nakamura Jiro
Ohsawa Youichi
Oikawa Katsuyuki
Tanaka Akinobu
Chu John S.
Nippon Telegraph and Telephone Corp.
Shin-Etsu Chemical Co. , Ltd.
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