Coating apparatus – Gas or vapor deposition – With treating means
Patent
1994-08-18
1997-10-21
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118723E, 118718, 118620, 219 7616, 21912147, 21912148, 2191215, 21912152, C23C 1600
Patent
active
056791674
ABSTRACT:
A plasma system forms a dense, uniform coating of metallic oxide or other material on a relatively large substrate of metal foil or other composition located a substantial distance from the plasma gun so that the plasma stream covers the entire width of the substrate. A large pressure differential between the pressure inside the plasma gun and the ambient pressure outside of the plasma gun creates a shock pattern within the exiting plasma-stream so as to disperse the plasma stream and maintain a high energy level therein, as well as thoroughly mixing a coating material introduced into the plasma stream within the gun. Mixing of the coating material within the plasma stream is further enhanced by introducing the coating material into the plasma stream in the form of very small particles. In one arrangement, the plasma stream is delivered in a long, narrow configuration across the width of the substrate by a nozzle with a slit-like opening at the lower end of the plasma gun. In still other arrangements, a plasma stream of elongated configuration is provided by a plasma gun of elongated configuration having an elongated cathode assembly disposed within the hollow interior of an elongated anode having a nozzle-forming slot therein.
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Bueker Richard
Lund Jeffrie R.
Sulzer Metco AG
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