4. Adhesive bonding and miscellaneous chemical manufacture
  5. Differential fluid etching apparatus
  6. With microwave gas energizing means

Yutaka Omoto

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Method and apparatus for plasma processing

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Patent

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Plasma processing equipment and plasma processing method...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Plasma processor

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Plasma treating method and apparatus therefor

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent

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Profile ID: LFUS-PAI-P-324201

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