Yoshiyuki Nozawa

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Details Yoshiyuki Nozawa Yoshiyuki Nozawa

: Semiconductor device manufacturing: process
: Chemical etching
: Vapor phase etching

: Inventor
: active

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Method for etching of a silicon substrate and etching apparatus

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching

Reexamination Certificate

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Profile ID: LFUS-PAI-P-3061668

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