Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
Inventor
active
Method for anisotropically etching tungsten using SF.sub.6, CHF.
Post-etch treatment of plasma-etched feature surfaces to prevent
No associations
LandOfFree
Xian-Can Deng does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Xian-Can Deng, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Xian-Can Deng will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-1248369