4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Thomas J. Cleary

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Apparatus for backside and edge exclusion of polymer film during

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Exclusion of polymer film from semiconductor wafer edge and...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Profile ID: LFUS-PAI-P-446206

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