4. Stock material or miscellaneous articles
  5. Composite
  6. Of quartz or glass

Thomas Benjamin Faure

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Method for dry etching photomask material

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Plasma resistant composition and use thereof

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Recovery of an anodically bonded glass device from a substrate b

Stock material or miscellaneous articles – Composite – Of quartz or glass
Patent

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Profile ID: LFUS-PAI-P-1591185

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