4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Tatuharu Yamamoto

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Method and apparatus for fabricating semiconductor devices

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent

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Processing method and equipment for processing a semiconductor d

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Substrate temperature control system and method for...

Electric heating – Heating devices – Combined with container – enclosure – or support for material...
Reexamination Certificate

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Substrate temperature control system and method for...

Heating – Accessory means for holding – shielding or supporting work...
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1430124

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