4. Semiconductor device manufacturing: process
  5. Making field effect device having pair of active regions...
  6. On insulating substrate or layer

Tatsuhiko Katayama

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Method of making semiconductor device having SIMOX structure

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

SOI substrate and method of producing the same

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

SOI substrate and method of producing the same

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Tatsuhiko Katayama does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Tatsuhiko Katayama, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tatsuhiko Katayama will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-155826

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure