4. Metal working
  5. Barrier layer or semiconductor device making

Taichi Fugita

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Apparatus for forming reduced pressure and for processing object

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Pressure-reduced chamber system having a filter means

Metal working – Barrier layer or semiconductor device making
Patent

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Profile ID: LFUS-PAI-P-1318161

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