4. Cleaning and liquid contact with solids
  5. Processes
  6. For metallic, siliceous, or calcareous basework, including...

Shih-Kuan Tai

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Method of low-K/copper dual damascene

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Protecting method applied to the semiconductor manufacturing...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Vapor treatment process for reducing oxide depletion

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent

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Profile ID: LFUS-PAI-P-1736784

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