4. Computer-aided design and analysis of circuits and semiconductor
  5. Design of semiconductor mask or reticle
  6. Manufacturing optimizations

Ryan P. Deschner

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Mask forming and implanting methods using implant stopping...

Semiconductor device manufacturing: process – Chemical etching – Altering etchability of substrate region by compositional or...
Reexamination Certificate

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Variable fill and cheese for mitigation of BEOL topography

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2263208

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