4. Coating processes
  5. Direct application of electrical, magnetic, wave, or...
  6. Pretreatment of coating supply or source outside of primary...

Roland Tso

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Apparatus and method for improving target erosion in hollow...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Apparatus and method for injecting and modifying gas...

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of coating supply or source outside of primary...
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Apparatus for electroplating copper onto semiconductor wafer

Chemistry: electrical and wave energy – Apparatus – Electrolytic
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Collimated deposition apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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High density plasma nitridation as diffusion barrier and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Profile ID: LFUS-PAI-P-2038384

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