4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Robert Stern

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Magnetically-enhanced plasma chamber with non-uniform magnetic f

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Workpiece support platen for semiconductor process chamber

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Profile ID: LFUS-PAI-P-1212537

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