4. Coating processes
  5. Centrifugal force utilized

Robert J. Stern

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Adjusting DC bias voltage in plasma chamber

Coating apparatus – Gas or vapor deposition – With treating means
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Apparatus and methods for handling a substrate

Handling: hand and hoist-line implements – Utilizing fluid pressure – Venturi effect
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Coater having a controllable pressurized process chamber for...

Coating processes – Centrifugal force utilized
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Conductive collar surrounding semiconductor workpiece in...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With workpiece support
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Detecting the endpoint of a chamber cleaning

Cleaning and liquid contact with solids – Processes – Combined
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Profile ID: LFUS-PAI-P-2016906

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