4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Richard Fovell

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Method of cooling a wafer support at a uniform temperature...

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Method of operating a capacitively coupled plasma reactor...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Temperature controlled window with a fluid supply system

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With heating or cooling means for apparatus part other than...
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Profile ID: LFUS-PAI-P-2301776

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