4. Coating apparatus
  5. Program, cyclic, or time control
  6. Having prerecorded program medium

Radko Gerard Bankras

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Chemical vapor deposition of TiN films in a batch reactor

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Deposition of TiN films in a batch reactor

Coating apparatus – Program – cyclic – or time control – Having prerecorded program medium
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2247198

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