4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Qingyuan Han

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Fluorine-free plasma curing process for porous low-k materials

Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...
Reexamination Certificate

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High modulus, low dielectric constant coatings

Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...
Reexamination Certificate

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High modulus, low dielectric constant coatings

Stock material or miscellaneous articles – Composite – Of silicon containing
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Method of stripping photoresist using re-coating material

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Removal of imaged layers
Reexamination Certificate

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Oxygen free plasma stripping process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Profile ID: LFUS-PAI-P-2082479

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