4. Chemistry of inorganic compounds
  5. Modifying or removing component of normally gaseous mixture

Peter Leslie Timms

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Methods and apparatus for treating a semiconductor substrate

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Processes for the scrubbing of noxious substances

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
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Treatment of gas mixtures

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
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Profile ID: LFUS-PAI-P-2004869

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