4. Fishing, trapping, and vermin destroying

Pervaiz Sultan

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Bias plasma deposition for selective low dielectric insulation

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent

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Bias plasma deposition for selective low dielectric insulation

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Patent

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Void free oxide fill for interconnect spaces

Fishing – trapping – and vermin destroying
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Profile ID: LFUS-PAI-P-960467

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